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[Article / Chinese and US designs] Points to note in international design applications designating China and the United States (Design Committee, Patent, April 2025)
Read the Japanese version / 日本語版を読む [Article / Chinese and US designs] Points to note in international design applications designating China and the United States (Design Committee, Patent, April 2025) 1. Points to note when designating the United States Design patent practice: In the United States, designs are protected under patent law, so claim clarity is given extremely high importance. If the original drawings are unclear, an amendment adding shading later carries a high